Cost Effective Equipment spin coaters have been the benchmark for photoresist processing since the Cee® Model 100 was introduced over 25 years ago. All of our high reliability spinners incorporate digital indirect spindle drive technology that eliminates the well-known chuck heating and motor reliability problems common in cheap spin coaters. http://apps.mnc.umn.edu/pub/equipment/cee1_cee2_spinner_1300x_sop.pdf
Cee® Programmable Exhaust: Optimal Thick-Film …
WebThe CEE-1 spinner is a PC-controlled spinner with a touch screen interface and display used for applying photoresist uniformly on a substrate. It is capable of spin speeds from 0 to 12,000 rpm and spin speed accelerations of 0 to 30,000 rpm/s. Spin speeds and time can be altered to achieve WebAll Cee® Spin developers can be configured for fan style top-spray or side-spray, and puddle dispense using multiple materials such as pre-wets, … falco becker
CEE Spin Coater/Hotplate Operation – Cleanroom …
WebUse spinner CEE-2 for Lift Off Resist (LOR), Spin on Glass, SU8 and any other material approved for use in this spinner c. Do not spin masks d. Do not program any spin speed higher than 6000 rpms with an acceleration of 30,000 per the manufacturer Required Facilities a. 120 Volts AC 300 Watts b. Vacuum 25” Hg c. Spinner exhaust: 1” d. Drain ... WebSep 9, 2024 · Contact. Ideal for thick photoresist deposition, the Brewer Spinner features a fully enclosed vacuum chuck for use with 4” wafers. It offers digital control of ramp rates and multi-step spin processes. It’s adjacent to an 8” Solitec hotplate and a larger precisely-leveled hotplate for use with millimeter-thick lithography. WebProgramming the Spinner - Press Reset on the control panel and ensure the display reads “CEE – 100CB Spinner” if it reads “CEE – 100CB Hotplate” press the Opt button. If … falco bethke